GL-50 Stretchability:High
GL-50 Temperature Resistance:High
GL-50 Conductivity:High
Color:Yellow
Chemical Resistance:Excellent
Uv Resistance:Excellent
Material:Polyimide
Color:Amber
Adhesive Type:Silicone
Material:Polyimide
Color:Yellow
UV Resistance:Excellent
Film Appearance:The base material shall achieve atomic-scale surface uniformity while exhibiting total elimination of morphological irregularities, nanoscale particulate embeddings, cross-linked polymer clusters, or non-native impurities throughout its operational zone, w
Film Thickness (um):38
Film Tensile Strengthh:180MPa
Film Appearance:The base material shall achieve atomic-scale surface uniformity while exhibiting total elimination of morphological irregularities, nanoscale particulate embeddings, cross-linked polymer clusters, or non-native impurities throughout its operational zone, w
Film Thickness (um):50
Film Tensile Strengthh:180MPa
Minimum Order Quantity:Negotiation
Price:$300-$30000
Packaging Details:Standard Packing
Thickness:0.5mm
Width:100mm
Release Liner:Silicone Coated
Film Appearance:The base material shall achieve atomic-scale surface uniformity while exhibiting total elimination of morphological irregularities, nanoscale particulate embeddings, cross-linked polymer clusters, or non-native impurities throughout its operational zone, w
Film Thickness (um):62
Film Tensile Strengthh:180MPa
Film Appearance:The base material shall achieve atomic-scale surface uniformity while exhibiting total elimination of morphological irregularities, nanoscale particulate embeddings, cross-linked polymer clusters, or non-native impurities throughout its operational zone, w
Film Thickness (um):50
Film Tensile Strengthh:180MPa
Film Appearance:The base material shall achieve atomic-scale surface uniformity while exhibiting total elimination of morphological irregularities, nanoscale particulate embeddings, cross-linked polymer clusters, or non-native impurities throughout its operational zone, w
Film Thickness (um):38
Film Tensile Strengthh:180MPa
Film Appearance:The base material shall achieve atomic-scale surface uniformity while exhibiting total elimination of morphological irregularities, nanoscale particulate embeddings, cross-linked polymer clusters, or non-native impurities throughout its operational zone, w
Film Thickness (um):5 7.5
Film Tensile Strengthh:170MPa